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resists
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Swelling of Poly(methyl methacrylate) Films in Different Solvent Vapor Environments: A Comparison of Solvents Used in Nanolithographic Processing
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Year
Spring 2019
1
School
Emory College
1
Department
Physics
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Degree
B.S.
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Submission Type
Honors Thesis
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Research Field
Chemistry, Polymer
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Engineering, Materials Science
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Physics, Condensed Matter
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Committee
Connie B. Roth, Emory University
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David Zureick-Brown, Emory University
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Eric R. Weeks, Emory University
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Keyword
dissolution
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electron beam lithography
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ellipsometry
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polymers
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resists
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